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Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Tae-Gon | - |
| dc.contributor.author | Kim, Donggyu | - |
| dc.contributor.author | Kim G. | - |
| dc.contributor.author | Park, Jingoo | - |
| dc.date.accessioned | 2024-09-24T06:30:33Z | - |
| dc.date.available | 2024-09-24T06:30:33Z | - |
| dc.date.issued | 2022-06 | - |
| dc.identifier.issn | 1938-5862 | - |
| dc.identifier.issn | 1938-6737 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/120569 | - |
| dc.description.abstract | The wetting behavior of solutions was successfully visualized in the high aspect ratio multi-stack trench pattern using the inclined-AFM methodology. The visualization allows the characterization of the wetting behavior of cleaning solutions on various hydrophobic surfaces. The experimental results agreed with the values calculated by the Wenzel & Cassie-Baxter model. The wetting characteristic analysis using inclined-AFM is an efficient method regardless of pattern dimensions. © 2022 ECS - The Electrochemical Society. | - |
| dc.format.extent | 6 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Institute of Physics | - |
| dc.title | Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1149/10804.0131ecst | - |
| dc.identifier.scopusid | 2-s2.0-85132436161 | - |
| dc.identifier.bibliographicCitation | ECS Transactions, v.108, no.4, pp 131 - 136 | - |
| dc.citation.title | ECS Transactions | - |
| dc.citation.volume | 108 | - |
| dc.citation.number | 4 | - |
| dc.citation.startPage | 131 | - |
| dc.citation.endPage | 136 | - |
| dc.type.docType | Conference paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.identifier.url | https://iopscience.iop.org/article/10.1149/10804.0131ecst | - |
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