Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Area-Selective Atomic Layer Deposition of Al2O3 Thin Films for Metal versus Dielectric Selectivity Using Vapor-Dosed Alkanethiol
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김우희 | - |
| dc.date.accessioned | 2025-01-05T05:31:39Z | - |
| dc.date.available | 2025-01-05T05:31:39Z | - |
| dc.date.issued | 2024-01-25 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/121812 | - |
| dc.title | Area-Selective Atomic Layer Deposition of Al2O3 Thin Films for Metal versus Dielectric Selectivity Using Vapor-Dosed Alkanethiol | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제 31회 한국반도체학술대회 | - |
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Kim, Woo Hee
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)