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Develop Behavior of Metal Organic Chemical Vapor Deposited Sn-based Inorganic Dry Resist for Next-generation EUV Lithography
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김우희 | - |
| dc.date.accessioned | 2025-01-05T05:31:40Z | - |
| dc.date.available | 2025-01-05T05:31:40Z | - |
| dc.date.issued | 2024-01-26 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/121814 | - |
| dc.title | Develop Behavior of Metal Organic Chemical Vapor Deposited Sn-based Inorganic Dry Resist for Next-generation EUV Lithography | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제 31회 한국반도체학술대회 | - |
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Related Researcher
- Kim, Woo Hee
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)