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Enhanced Deposition Selectivity of High-k Dielectrics by Vapor Dosing and Selective Removal of Phosphonic Acid Inhibitors
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김우희 | - |
| dc.date.accessioned | 2025-01-05T05:31:41Z | - |
| dc.date.available | 2025-01-05T05:31:41Z | - |
| dc.date.issued | 2024-05-24 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/121815 | - |
| dc.title | Enhanced Deposition Selectivity of High-k Dielectrics by Vapor Dosing and Selective Removal of Phosphonic Acid Inhibitors | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국반도체디스플레이기술학회 국내학술대회 | - |
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Related Researcher
- Kim, Woo Hee
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)