High-performance Thin-Film Transistors with ITZO/IGZO Hetero junction
DC Field | Value | Language |
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dc.contributor.author | Xiao, Zhenyuan | - |
dc.contributor.author | Zhang, Shibo | - |
dc.contributor.author | Jin, Jidong | - |
dc.contributor.author | Kim, Jaekyun | - |
dc.date.accessioned | 2025-09-12T00:30:28Z | - |
dc.date.available | 2025-09-12T00:30:28Z | - |
dc.date.issued | 2025-07 | - |
dc.identifier.issn | 0097-966X | - |
dc.identifier.issn | 2168-0159 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/126408 | - |
dc.description.abstract | This study systematically investigates the electrical performance and stability of bilayer hetero junction ITZO/IGZO thin-film transistors (TFTs) with variable channel structure. The 7.5 nm ITZO / 7.5 nm IGZO channel structure TFT achieves optimal device performance, exhibiting a saturation mobility of 40.71 ± 0.75 cm2/Vs, a subthreshold swing of 0.19 ± 0.01 V/dec, a threshold voltage of 3.25 ± 0.18 V, and an on/off current ratio of approximately 108. Compared to single-channel ITZO TFTs, the optimized heterojunction ITZO/IGZO TFT demonstrates enhanced mobility and stability, which can be attributed to the formation of a two-dimensional electron gas (2DEG) at the hetero junction interface. Furthermore, this study provides experimental confirmation of a 2DEG’s at the interface, underscoring its crucial role in improving device performance. These findings highlight the potential of bilayer heterojunction TFTs for next-generation displays. © 2025, John Wiley and Sons Inc. All rights reserved. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | John Wiley and Sons Inc | - |
dc.title | High-performance Thin-Film Transistors with ITZO/IGZO Hetero junction | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/sdtp.18940 | - |
dc.identifier.scopusid | 2-s2.0-105013024200 | - |
dc.identifier.bibliographicCitation | Digest of Technical Papers - SID International Symposium, v.56, no.S1, pp 820 - 824 | - |
dc.citation.title | Digest of Technical Papers - SID International Symposium | - |
dc.citation.volume | 56 | - |
dc.citation.number | S1 | - |
dc.citation.startPage | 820 | - |
dc.citation.endPage | 824 | - |
dc.type.docType | Conference paper | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | High mobility | - |
dc.subject.keywordAuthor | Oxide semiconductor | - |
dc.subject.keywordAuthor | Thin-film transistor | - |
dc.subject.keywordAuthor | Two-dimensional electron gas | - |
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