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High-performance Thin-Film Transistors with ITZO/IGZO Hetero junction

Authors
Xiao, ZhenyuanZhang, ShiboJin, JidongKim, Jaekyun
Issue Date
Jul-2025
Publisher
John Wiley and Sons Inc
Keywords
High mobility; Oxide semiconductor; Thin-film transistor; Two-dimensional electron gas
Citation
Digest of Technical Papers - SID International Symposium, v.56, no.S1, pp 820 - 824
Pages
5
Indexed
SCOPUS
Journal Title
Digest of Technical Papers - SID International Symposium
Volume
56
Number
S1
Start Page
820
End Page
824
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/126408
DOI
10.1002/sdtp.18940
ISSN
0097-966X
2168-0159
Abstract
This study systematically investigates the electrical performance and stability of bilayer hetero junction ITZO/IGZO thin-film transistors (TFTs) with variable channel structure. The 7.5 nm ITZO / 7.5 nm IGZO channel structure TFT achieves optimal device performance, exhibiting a saturation mobility of 40.71 ± 0.75 cm2/Vs, a subthreshold swing of 0.19 ± 0.01 V/dec, a threshold voltage of 3.25 ± 0.18 V, and an on/off current ratio of approximately 108. Compared to single-channel ITZO TFTs, the optimized heterojunction ITZO/IGZO TFT demonstrates enhanced mobility and stability, which can be attributed to the formation of a two-dimensional electron gas (2DEG) at the hetero junction interface. Furthermore, this study provides experimental confirmation of a 2DEG’s at the interface, underscoring its crucial role in improving device performance. These findings highlight the potential of bilayer heterojunction TFTs for next-generation displays. © 2025, John Wiley and Sons Inc. All rights reserved.
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ERICA 첨단융합대학 (ERICA 반도체·디스플레이공학전공)
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