High-performance Thin-Film Transistors with ITZO/IGZO Hetero junction
- Authors
- Xiao, Zhenyuan; Zhang, Shibo; Jin, Jidong; Kim, Jaekyun
- Issue Date
- Jul-2025
- Publisher
- John Wiley and Sons Inc
- Keywords
- High mobility; Oxide semiconductor; Thin-film transistor; Two-dimensional electron gas
- Citation
- Digest of Technical Papers - SID International Symposium, v.56, no.S1, pp 820 - 824
- Pages
- 5
- Indexed
- SCOPUS
- Journal Title
- Digest of Technical Papers - SID International Symposium
- Volume
- 56
- Number
- S1
- Start Page
- 820
- End Page
- 824
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/126408
- DOI
- 10.1002/sdtp.18940
- ISSN
- 0097-966X
2168-0159
- Abstract
- This study systematically investigates the electrical performance and stability of bilayer hetero junction ITZO/IGZO thin-film transistors (TFTs) with variable channel structure. The 7.5 nm ITZO / 7.5 nm IGZO channel structure TFT achieves optimal device performance, exhibiting a saturation mobility of 40.71 ± 0.75 cm2/Vs, a subthreshold swing of 0.19 ± 0.01 V/dec, a threshold voltage of 3.25 ± 0.18 V, and an on/off current ratio of approximately 108. Compared to single-channel ITZO TFTs, the optimized heterojunction ITZO/IGZO TFT demonstrates enhanced mobility and stability, which can be attributed to the formation of a two-dimensional electron gas (2DEG) at the hetero junction interface. Furthermore, this study provides experimental confirmation of a 2DEG’s at the interface, underscoring its crucial role in improving device performance. These findings highlight the potential of bilayer heterojunction TFTs for next-generation displays. © 2025, John Wiley and Sons Inc. All rights reserved.
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