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열처리 후공정이 HAZO-채널 박막 트랜지스터의 특성에 미치는 영향

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dc.contributor.author이상혁-
dc.contributor.author전현식-
dc.contributor.author박주희-
dc.contributor.author김원-
dc.contributor.author박진석-
dc.date.accessioned2021-06-22T16:24:56Z-
dc.date.available2021-06-22T16:24:56Z-
dc.date.issued2016-07-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/13189-
dc.description.abstractOxide thin film transistors (O-TFTs) were fabricated by using hafnium-doped aluminum-zinc oxide (HAZO) films as the active-channel. The HAZO films were deposited via co-sputtering method. Furnace annealing was carried out on the deposited HAZO films. The effects of the post-treatment on the transmittance and crystalline structure of the HAZO films were analyzed as functions of the post-treatment conditions used. It was observed that the off-current of the HAZO-TFTs drastically decreased after the furnace annealing. The experiment results also showed that furnace annealing would be an effective method for improving the electrical characteristics of HAZO-TFTs.-
dc.format.extent2-
dc.language한국어-
dc.language.isoKOR-
dc.publisher대한전기학회-
dc.title열처리 후공정이 HAZO-채널 박막 트랜지스터의 특성에 미치는 영향-
dc.title.alternativeEffects of thermal post-treatment on the characteristics of HAZO-channel thin film transistors-
dc.typeArticle-
dc.publisher.location대한민국-
dc.identifier.bibliographicCitation2016년도 대한전기학회 하계학술대회논문집, pp 1157 - 1158-
dc.citation.title2016년도 대한전기학회 하계학술대회논문집-
dc.citation.startPage1157-
dc.citation.endPage1158-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.identifier.urlhttps://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE07011763-
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ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)
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