Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, In-Seon | - |
dc.contributor.author | Kim, Guk-Jin | - |
dc.contributor.author | Yeung, Michael | - |
dc.contributor.author | Barouch, Eytan | - |
dc.contributor.author | Kim, Seong-Wook | - |
dc.contributor.author | Oh, Hye-Keun | - |
dc.date.accessioned | 2021-06-22T16:25:45Z | - |
dc.date.available | 2021-06-22T16:25:45Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2016-08 | - |
dc.identifier.issn | 1932-5150 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/13227 | - |
dc.description.abstract | A high numerical aperture (NA) system with an NA larger than 0.5 is required to make patterns of 1X nm and below, even though extreme ultraviolet lithography uses a 13.5-nm wavelength source. To avoid the reflective efficiency loss and to avoid an increase in the chief ray angle of incident light, use of an anamorphic high-NA system is suggested. The suggested anamorphic NA system has nonisotropic magnification, x-magnification of 4x and y-magnification of 8x, and the mask NA shape is an ellipse due to the nonisotropic magnification distribution. Anamorphic NA systems have a nonconventional shadow effect due to nonisotropic incident angle distribution and magnification. These nonisotropic characteristics lead to the reduction of asymmetric shadow distribution and a reduction of horizontal-vertical bias. As a result, anamorphic NA systems can achieve balanced patterning results regardless of pattern direction and incident direction. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | SPIE - International Society for Optical Engineering | - |
dc.title | Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Seong-Wook | - |
dc.contributor.affiliatedAuthor | Oh, Hye-Keun | - |
dc.identifier.doi | 10.1117/1.JMM.15.3.033504 | - |
dc.identifier.scopusid | 2-s2.0-84982833633 | - |
dc.identifier.wosid | 000388219500015 | - |
dc.identifier.bibliographicCitation | Journal of Micro/ Nanolithography, MEMS, and MOEMS, v.15, no.3, pp.33504 - 33504 | - |
dc.relation.isPartOf | Journal of Micro/ Nanolithography, MEMS, and MOEMS | - |
dc.citation.title | Journal of Micro/ Nanolithography, MEMS, and MOEMS | - |
dc.citation.volume | 15 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 33504 | - |
dc.citation.endPage | 33504 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.subject.keywordAuthor | extreme ultraviolet lithography | - |
dc.subject.keywordAuthor | anamorphic numerical aperture | - |
dc.subject.keywordAuthor | shadow effects | - |
dc.identifier.url | https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-15/issue-3/033504/Anisotropic-shadow-effects-with-various-pattern-directions-in-an-anamorphic/10.1117/1.JMM.15.3.033504.short?SSO=1 | - |
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