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Reduced distributions of the set current and the voltage of unipolar resistance switching in a current-biased set process

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dc.contributor.authorNa, Sang-Chul-
dc.contributor.authorChun, Min Chul-
dc.contributor.authorJang, Gyuyeon-
dc.contributor.authorShin, Hyejin-
dc.contributor.authorKwon, Young-Sun-
dc.contributor.authorKang, Bo Soo-
dc.contributor.authorLee, Keundong-
dc.contributor.authorYoon, Chansoo-
dc.contributor.authorPark, Bae Ho-
dc.date.accessioned2021-06-22T16:43:13Z-
dc.date.available2021-06-22T16:43:13Z-
dc.date.created2021-01-21-
dc.date.issued2016-06-
dc.identifier.issn0374-4884-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/13624-
dc.description.abstractThe set process in a unipolar resistance switching Pt/NiO/Pt thin film was conducted in two different ways: the current-biased set process (current sweep mode) and the voltage-biased set process (voltage sweep mode). In the current-biased set process, a compliance current setting was not necessary for continuing stable resistance switching. The resistance of the low resistance state, the reset and the set switching parameters were compared in both modes of the set processes. The distributions of the set parameters were found to be effectively reduced in the current-biased set process. These intriguing properties can be attributed to the prevention of an overshoot current during the set transition.-
dc.language영어-
dc.language.isoen-
dc.publisherKOREAN PHYSICAL SOC-
dc.titleReduced distributions of the set current and the voltage of unipolar resistance switching in a current-biased set process-
dc.typeArticle-
dc.contributor.affiliatedAuthorKang, Bo Soo-
dc.identifier.doi10.3938/jkps.68.1467-
dc.identifier.scopusid2-s2.0-84977084232-
dc.identifier.wosid000378943400017-
dc.identifier.bibliographicCitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.68, no.12, pp.1467 - 1471-
dc.relation.isPartOfJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.titleJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.volume68-
dc.citation.number12-
dc.citation.startPage1467-
dc.citation.endPage1471-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.identifier.kciidART002120945-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Multidisciplinary-
dc.subject.keywordPlusRESISTIVE MEMORY-
dc.subject.keywordPlusHIGH-DENSITY-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusLAYER-
dc.subject.keywordAuthorUnipolar resistance switching-
dc.subject.keywordAuthorCurrent-biased set process-
dc.subject.keywordAuthorNiO thin film-
dc.identifier.urlhttps://link.springer.com/article/10.3938/jkps.68.1467-
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