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Gate-Bias Stability Behavior Tailored by Dielectric Polymer Stereostructure in Organic Transistors

Authors
Lee, JunghwiMin, HonggiPark, NamwooJeong, HeejeongHan, SinguKim, Se HyunLee, Hwa sung
Issue Date
Oct-2015
Publisher
American Chemical Society
Keywords
configurational arrangement; operational stability; organic field-effect transistor; polymer dielectric; polymer stereostructure
Citation
ACS Applied Materials and Interfaces, v.7, no.45, pp.25045 - 25052
Indexed
SCIE
SCOPUS
Journal Title
ACS Applied Materials and Interfaces
Volume
7
Number
45
Start Page
25045
End Page
25052
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/16513
DOI
https://doi.org/10.1021/acsami.5b08414
ISSN
1944-8244
Abstract
Understanding charge trapping in a polymer dielectric is critical to the design of high-performance organic field-effect transistors (OFETs). We investigated the OFET stability as a function of the dielectric polymer stereostructure under a gate bias stress and during long-term operation. To this end, iso-, syn-, and atactic poly(methyl methacrylate) (PMMA) polymers with identical molecular weights and polydispersity indices were selected. The PMMA stereostructure was found to significantly influence the charge trapping behavior and trap formation in the polymer dielectrics. This influence was especially strong in the bulk region rather than in the surface region. The regular configurational arrangements (isotactic > syntactic > atactic) of the pendant groups on the PMMA backbone chain facilitated closer packing between the polymer interchains and led to a higher crystallinity of the polymer dielectric, which caused a reduction in the free volumes that act as sites for charge trapping and air molecule absorption. The PMMA dielectrics with regular stereostructures (iso- and syn-stereoisomers) exhibited more stable OFET operation under bias stress compared to devices prepared using irregular a-PMMA in both vacuum and air. © 2015 American Chemical Society.
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Lee, Hwa sung
ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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