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Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
- Authors
- Kim, Eunah; Cho, Yunae; Park, Kwang-Tae; Choi, Jun-Hyuk; Lim, Seung-Hyuk; Cho, Yong-Hoon; Nam, Yoon-Ho; Lee, Jung-Ho; Kim, Dong-Wook
- Issue Date
- Apr-2015
- Publisher
- Springer Verlag
- Keywords
- Si; Nanocone array; Antireflection; Mie resonance; Nanoimprint
- Citation
- Nanoscale Research Letters, v.10, pp 1 - 5
- Pages
- 5
- Indexed
- SCIE
SCOPUS
- Journal Title
- Nanoscale Research Letters
- Volume
- 10
- Start Page
- 1
- End Page
- 5
- ISSN
- 1931-7573
1556-276X
- Abstract
- We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection.
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Related Researcher
- Lee, Jung-Ho
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)