Multi-stack extreme-ultraviolet pellicle with out-of-band reduction
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Sung gyu | - |
dc.contributor.author | Kim, Guk jin | - |
dc.contributor.author | Kim, In seon | - |
dc.contributor.author | Ahn, Jin ho | - |
dc.contributor.author | Park, Jin-Goo | - |
dc.contributor.author | Oh, Hye keun | - |
dc.date.accessioned | 2021-06-22T21:42:56Z | - |
dc.date.available | 2021-06-22T21:42:56Z | - |
dc.date.issued | 2015-05 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/20598 | - |
dc.description.abstract | The out-of-band (OoB) radiation that can cause serious aerial image deformation on the wafer is reported. In order to check the maximum allowable OoB radiation reflectivity at the extreme ultra-violet (EUV) pellicle, we simulated the effect of OoB radiation and found that the maximum allowable OoB radiation reflectivity at the pellicle should be smaller than 15 % which satisfy our criteria such as aerial image critical dimension (CD), contrast, and normalized image log slope (NILS). We suggested a new multi-stack EUV pellicle that can have high EUV transmission, minimal OoB radiation reflectivity, and enough deep ultra-violet transmission for inspection and alignment of the mask through the EUV pellicle. © 2015 SPIE. | - |
dc.format.extent | 11 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | SPIE | - |
dc.title | Multi-stack extreme-ultraviolet pellicle with out-of-band reduction | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1117/12.2086052 | - |
dc.identifier.scopusid | 2-s2.0-84931398212 | - |
dc.identifier.wosid | 000354599900057 | - |
dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.9422, pp 1 - 11 | - |
dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.volume | 9422 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 11 | - |
dc.type.docType | Conference Paper | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | Contamination | - |
dc.subject.keywordPlus | Extreme ultraviolet lithography | - |
dc.subject.keywordPlus | Lithography | - |
dc.subject.keywordPlus | Reflection | - |
dc.subject.keywordPlus | Critical dimension | - |
dc.subject.keywordPlus | Deep ultraviolet | - |
dc.subject.keywordPlus | EUV Pellicle | - |
dc.subject.keywordPlus | Extreme Ultraviolet | - |
dc.subject.keywordPlus | Extreme ultraviolets | - |
dc.subject.keywordPlus | Multi-Stack Pellicle | - |
dc.subject.keywordPlus | Normalized image log slopes | - |
dc.subject.keywordPlus | Out-of-band radiation | - |
dc.subject.keywordPlus | Radiation | - |
dc.subject.keywordAuthor | Contamination | - |
dc.subject.keywordAuthor | EUV Pellicle | - |
dc.subject.keywordAuthor | Extreme-Ultraviolet Lithography | - |
dc.subject.keywordAuthor | Multi-Stack Pellicle | - |
dc.subject.keywordAuthor | Out-of-Band Radiation | - |
dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9422/1/Multi-stack-extreme-ultraviolet-pellicle-with-out-of-band-reduction/10.1117/12.2086052.short | - |
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