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High performance H-2 evolution realized in 20 mu m-thin silicon nanostructured photocathodes

Authors
Jung, Jin-YoungPark, Min-JoonLi, XiaopengKim, Jong-HoWehrspohn, Ralf B.Lee, Jung-Ho
Issue Date
Apr-2015
Publisher
Royal Society of Chemistry
Citation
Journal of Materials Chemistry A, v.3, no.18, pp.9456 - 9460
Indexed
SCIE
SCOPUS
Journal Title
Journal of Materials Chemistry A
Volume
3
Number
18
Start Page
9456
End Page
9460
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/21003
DOI
10.1039/c5ta00156k
ISSN
2050-7488
Abstract
Thickness reduction in high-purity silicon wafers is beneficial for cost-efficient hydrogen evolution utilizing silicon photocathodes. However, two major issues need to be resolved: insufficient light absorption by a thin Si absorber and poor charge transfer reaction by dominant surface recombination. Here, we present 20 mm-thin Si photocathodes employing Pt-nanoparticle-coated silicon nanoholes that realize a photocurrent of 23 mA cm(-2) (at 0 V vs. RHE) corresponding to the amount typically achieved by a conventional wafer (similar to 200 mm-thick).
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ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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