Organic semiconductor wastewater treatment using a four-stage Bardenpho with membrane system
- Authors
- Chung, Jinwook; Fleege, Daniel; Ong, Say Kee; Lee, Yong-Woo
- Issue Date
- Nov-2014
- Publisher
- Selper Ltd.
- Keywords
- four-stage Bardenpho; hydraulic retention time; membrane; semiconductor; specific denitrification rate
- Citation
- Environmental Technology (United Kingdom), v.35, no.22, pp 2837 - 2845
- Pages
- 9
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- Environmental Technology (United Kingdom)
- Volume
- 35
- Number
- 22
- Start Page
- 2837
- End Page
- 2845
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/21486
- DOI
- 10.1080/09593330.2014.924565
- ISSN
- 0959-3330
1479-487X
- Abstract
- Electronic wastewater from a semiconductor plant was treated with a pilot-scale four-stage Bardenpho process with membrane system. The system was operated over a 14-month period with an overall hydraulic retention time (HRT) ranging from 9.5 to 30 h. With a few exceptions, the pilot plant consistently treated the electronic wastewater with an average removal efficiency of chemical oxygen demand (COD) and total nitrogen of 97% and 93%, respectively, and achieving effluent quality of COD < 15 mg/L, turbidity < 1, and silt density index < 1. Based on removal efficiencies of the pilot plant, it is possible to lower the HRT to less than 9.5 h to achieve comparable removal efficiencies. An energy-saving configuration where an internal recycle line was omitted and the biomass recycle was rerouted to the pre-anoxic tank, can reduce energy consumption by 8.6% and gave removal efficiencies that were similar to the Bardenpho process. The system achieved pre-anoxic and post-anoxic specific denitrification rate values with a 95% confidence interval of 0.091 +/- 0.011 g NO3-N/g MLVSS d and 0.087 +/- 0.016 g NO3-N/g MLVSS d, respectively. The effluent from the four-stage Bardenpho with membrane system can be paired with a reverse osmosis system to provide further treatment for reuse purposes.
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