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Fully Current-Based Sub-Bandgap Optoelectronic Differential Ideality Factor Technique and Extraction of Subgap DOS in Amorphous Semiconductor TFTs

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dc.contributor.authorBae, Hagyoul-
dc.contributor.authorSeo, Hyojoon-
dc.contributor.authorJun, Sungwoo-
dc.contributor.authorChoi, Hyunjun-
dc.contributor.authorAhn, Jaeyeop-
dc.contributor.authorHwang, Junseok-
dc.contributor.authorLee, Jungmin-
dc.contributor.authorOh, Saeroonter-
dc.contributor.authorBae, Jong-Uk-
dc.contributor.authorChoi, Sung-Jin-
dc.contributor.authorKim, Dae Hwan-
dc.contributor.authorKim, Dong Myong-
dc.date.accessioned2021-06-22T22:25:08Z-
dc.date.available2021-06-22T22:25:08Z-
dc.date.created2021-01-21-
dc.date.issued2014-10-
dc.identifier.issn0018-9383-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/21585-
dc.description.abstractA sub-bandgap optoelectronic differential ideality factor technique is proposed for extraction of the intrinsic density-of-states (DOS) over the bandgap in amorphous semiconductor thin-film transistors (TFTs). In the proposed technique, the gate bias-dependent differential change in the difference of ideality factors (d Delta eta(V-GS)/dV(GS)) between dark and sub-bandgap photonic excitation condition is employed. With the sub-bandgap photons (h nu < E-g), the photonic excitation of electrons is confined only from the localized DOS over the bandgap. We applied the proposed technique to a-InGaZnO TFTs with W/L = 50/25 mu m/mu m and extracted the energy distribution of the intrinsic DOS for the localized states over the bandgap.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleFully Current-Based Sub-Bandgap Optoelectronic Differential Ideality Factor Technique and Extraction of Subgap DOS in Amorphous Semiconductor TFTs-
dc.typeArticle-
dc.contributor.affiliatedAuthorOh, Saeroonter-
dc.identifier.doi10.1109/TED.2014.2348592-
dc.identifier.scopusid2-s2.0-84907459038-
dc.identifier.wosid000342909800032-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON ELECTRON DEVICES, v.61, no.10, pp.3566 - 3569-
dc.relation.isPartOfIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.titleIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.volume61-
dc.citation.number10-
dc.citation.startPage3566-
dc.citation.endPage3569-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusDENSITY-OF-STATES-
dc.subject.keywordPlusCAPACITANCE-
dc.subject.keywordAuthorAmorphous oxide semiconductor-
dc.subject.keywordAuthordensity-of-states (DOS)-
dc.subject.keywordAuthordifferential ideality factor-
dc.subject.keywordAuthorInGaZnO (IGZO)-
dc.subject.keywordAuthoroptoelectronic-
dc.subject.keywordAuthorsubgap thin-film transistor (TFT)-
dc.subject.keywordAuthorsubthreshold-
dc.subject.keywordAuthorTFT-
dc.identifier.urlhttps://ieeexplore.ieee.org/document/6891249-
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OH, SAE ROON TER
ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)
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