Photoresist 의 합성에 따른 lithography 공정 후 패턴의 표면 거칠기 변화에 대한 전산모사

오혜근

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Photoresist 의 합성에 따른 lithography 공정 후 패턴의 표면 거칠기 변화에 대한 전산모사

Authors: 오혜근

Issue Date: 23-Apr-2009

Publisher: 한국물리학회

Citation: 2009년 봄 학술논문발표회 및 제 85회 정기총회

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/24941

Conference Name: 2009년 봄 학술논문발표회 및 제 85회 정기총회

Place: 대전컨벤션센터

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Appears in Collections: COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 2. Conference Papers

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