A study of the effect of pellicle support structures on aerial-image quality in EUV lithography by rigorous electromagnetic simulation
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yeung, Michael S. | - |
dc.contributor.author | Barouch, Eytan | - |
dc.contributor.author | Oh, Hye-Keun | - |
dc.date.accessioned | 2021-06-23T01:24:08Z | - |
dc.date.available | 2021-06-23T01:24:08Z | - |
dc.date.issued | 2014-04 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/25459 | - |
dc.description.abstract | To protect an EUV mask from contamination, a pellicle can be used. However, the pellicle membrane must be very thin due to EUV absorption. As a result, a pellicle support structure is needed to avoid deflection of the membrane by gravity. Previous authors have shown that such a structure would produce a non-uniform intensity distribution on the wafer. In this paper, we use simulation to re-examine the issue. The results show that, when coherent illumination is used, a pellicle support structure would have an undesirable effect on the aerial image. However, we also show that, when partially coherent illumination is used, the intensity non-uniformity caused by the pellicle support structure can be effectively smoothed out, resulting in a perfectly acceptable aerial image. © 2014 SPIE. | - |
dc.format.extent | 7 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | SPIE | - |
dc.title | A study of the effect of pellicle support structures on aerial-image quality in EUV lithography by rigorous electromagnetic simulation | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1117/12.2045618 | - |
dc.identifier.scopusid | 2-s2.0-84902161560 | - |
dc.identifier.wosid | 000339325800055 | - |
dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.9048, pp 1 - 7 | - |
dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.volume | 9048 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 7 | - |
dc.type.docType | Conference Paper | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.subject.keywordPlus | Extreme ultraviolet lithography | - |
dc.subject.keywordPlus | Lithography | - |
dc.subject.keywordPlus | Photomasks | - |
dc.subject.keywordPlus | Coherent illumination | - |
dc.subject.keywordPlus | Electromagnetic simulation | - |
dc.subject.keywordPlus | EUV mask | - |
dc.subject.keywordPlus | EUV pellicle | - |
dc.subject.keywordPlus | Intensity distribution | - |
dc.subject.keywordPlus | Lithography Simulation | - |
dc.subject.keywordPlus | Partially coherent illumination | - |
dc.subject.keywordPlus | Undesirable effects | - |
dc.subject.keywordPlus | Ground supports | - |
dc.subject.keywordAuthor | EUV mask | - |
dc.subject.keywordAuthor | EUV pellicle | - |
dc.subject.keywordAuthor | lithography simulation | - |
dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9048/1/A-study-of-the-effect-of-pellicle-support-structures-on/10.1117/12.2045618.short | - |
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