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22 nm Node Process Latitude Variation due to Imperfect Reflection form EUV Mask Multilayer
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T01:34:25Z | - |
| dc.date.available | 2021-06-23T01:34:25Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2008-09-30 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/25802 | - |
| dc.publisher | SEMATECH | - |
| dc.title | 22 nm Node Process Latitude Variation due to Imperfect Reflection form EUV Mask Multilayer | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | 2008 International Symposium on Extreme Ultraviolet Lithography | - |
| dc.relation.isPartOf | 2008 International Symposium on Extreme Ultraviolet Lithography | - |
| dc.citation.title | 2008 International Symposium on Extreme Ultraviolet Lithography | - |
| dc.citation.conferencePlace | California, Lake Tahoe | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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