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22 nm Node Process Latitude Variation due to Imperfect Reflection form EUV Mask Multilayer
- Authors
- 오혜근
- Issue Date
- 30-Sep-2008
- Publisher
- SEMATECH
- Citation
- 2008 International Symposium on Extreme Ultraviolet Lithography
- Conference Name
- 2008 International Symposium on Extreme Ultraviolet Lithography
- Place
- California, Lake Tahoe
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