Shockwave-induced deformation of organic particles during laser shockwave cleaning
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Tae Hoon | - |
dc.contributor.author | Cho, Hanchul | - |
dc.contributor.author | Busnaina, Ahmed | - |
dc.contributor.author | Park, Jin-Goo | - |
dc.contributor.author | Kim, Dongsik | - |
dc.date.accessioned | 2021-06-23T02:45:01Z | - |
dc.date.available | 2021-06-23T02:45:01Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2013-08 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/27178 | - |
dc.description.abstract | Although the laser shockwave cleaning process offers a promising alternative to conventional dry-cleaning processes for nanoscale particle removal, its difficulty in removing organic particles has been an unexplained problem. This work elucidates the physics underlying the ineffectiveness of removing organic particles using laser shock cleaning utilizing polystyrene latex particles on silicon substrates. It is found that the shockwave pressure is high enough to deform the particles, increasing the contact radius and consequently the particle adhesion force. The particle deformation has been verified by high-angle scanning electron microscopy. The Maugis-Pollock theory has been applied to predict the contact radius, showing good agreement with the experiment. (C) 2013 AIP Publishing LLC. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | American Institute of Physics | - |
dc.title | Shockwave-induced deformation of organic particles during laser shockwave cleaning | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jin-Goo | - |
dc.identifier.doi | 10.1063/1.4818307 | - |
dc.identifier.scopusid | 2-s2.0-84883339798 | - |
dc.identifier.wosid | 000323177100004 | - |
dc.identifier.bibliographicCitation | Journal of Applied Physics, v.114, no.6, pp.1 - 4 | - |
dc.relation.isPartOf | Journal of Applied Physics | - |
dc.citation.title | Journal of Applied Physics | - |
dc.citation.volume | 114 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 4 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | NANOPARTICLE REMOVAL | - |
dc.subject.keywordPlus | INDUCED PLASMA | - |
dc.subject.keywordPlus | ADHESION | - |
dc.subject.keywordPlus | HUMIDITY | - |
dc.subject.keywordPlus | WAVES | - |
dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.4818307 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.