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Mechanisms of Colloidal Ceria Contamination and Cleaning during Oxide Post-CMP
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김태곤 | - |
| dc.date.accessioned | 2021-06-22T09:45:08Z | - |
| dc.date.available | 2021-06-22T09:45:08Z | - |
| dc.date.issued | 2020-09-02 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/2729 | - |
| dc.title | Mechanisms of Colloidal Ceria Contamination and Cleaning during Oxide Post-CMP | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | THE SURFACE PREPARATION AND CLEANING CONFERENCE | - |
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Related Researcher
- KIM, TAE GON
- ERICA 공학대학 (MAJOR IN APPLIED MATERIAL & COMPONENTS)