Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Mask modification for the shadow effect reduction by rigorous coupled-wave analysis in extreme ultraviolet lithography
- Authors
- 오혜근
- Issue Date
- 7-Nov-2005
- Publisher
- SEMATECH
- Citation
- Fourth International Extreme Ultra Violet Lithography (EUVL) Symposium
- Conference Name
- Fourth International Extreme Ultra Violet Lithography (EUVL) Symposium
- Place
- 미국 샌디에고
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.