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C4F8을 이용한 나노미터 두께를 가지는 Hot Embossing 용 마스터의 점착방지막 형성
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박진구 | - |
| dc.date.accessioned | 2021-06-23T05:27:03Z | - |
| dc.date.available | 2021-06-23T05:27:03Z | - |
| dc.date.issued | 2004-05-14 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/30598 | - |
| dc.title | C4F8을 이용한 나노미터 두께를 가지는 Hot Embossing 용 마스터의 점착방지막 형성 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2004 한국재료학회 춘계학술대회 | - |
| dc.citation.conferencePlace | 강릉대학교 | - |
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)