Pattern dependent mask distortion with extreme ultraviolet exposure

오혜근

Detailed Information

Cited 0 time in webofscience

Cited 0 time in scopus

Metadata Downloads

Pattern dependent mask distortion with extreme ultraviolet exposure

Authors: 오혜근

Issue Date: 26-Feb-2020

Publisher: SPIE

Citation: SPIE 2020 Advanced Lithography

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/3164

Conference Name: SPIE 2020 Advanced Lithography

Place: San Jose, CA, USA

Files in This Item: There are no files associated with this item.

Appears in Collections: COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 2. Conference Papers

Show full item record

qrcode

Altmetrics

Total Views & Downloads

RSS_1.0 RSS_2.0 ATOM_1.0

55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

Detailed Information

Altmetrics

Total Views & Downloads

BROWSE