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Time-resolved photoluminescence studies of the optical quality of InGaN/GaN multi-quantum well grown by MOCVD-antimony surfactant effect

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dc.contributor.authorBaranowski, Michal .-
dc.contributor.authorLatkowska, Magdalena-
dc.contributor.authorKudrawiec, Robert-
dc.contributor.authorSyperek, Marcin-
dc.contributor.authorMisiewicz, Jan-
dc.contributor.authorSadasivam, Karthikeyan Giri-
dc.contributor.authorShim, Jong-In-
dc.contributor.authorLee, June Key-
dc.date.accessioned2021-06-23T06:26:37Z-
dc.date.available2021-06-23T06:26:37Z-
dc.date.created2021-01-21-
dc.date.issued2012-10-
dc.identifier.issn0268-1242-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/31819-
dc.description.abstractThe influence of antimony on the optical quality of InGaN/GaN multi-quantum well (MQW) grown by metalorganic chemical vapor deposition has been investigated by means of photoluminescence and time-resolved photoluminescence for a set of samples obtained for the Sb/(In+Ga) flow ratio varying from 0% to 0.12%. It has been observed that by using proper Sb flow it is possible to improve the optical properties of InGaN/GaN MQWs; however, too large Sb flows cause their optical quality to deteriorate. The Sb-related improvement of optical properties has been observed as (i) similar to 30% increase of PL intensity, (ii) reduction of temperature-induced photoluminescence quenching and (iii) elongation of PL decay time by 30%. The atomic force microscopy study and second ion mass spectrometry profiles show that optical quality improvement is connected with surfactant properties of antimony.-
dc.language영어-
dc.language.isoen-
dc.publisherInstitute of Physics Publishing-
dc.titleTime-resolved photoluminescence studies of the optical quality of InGaN/GaN multi-quantum well grown by MOCVD-antimony surfactant effect-
dc.typeArticle-
dc.contributor.affiliatedAuthorShim, Jong-In-
dc.identifier.doi10.1088/0268-1242/27/10/105027-
dc.identifier.scopusid2-s2.0-84866309955-
dc.identifier.wosid000309111800029-
dc.identifier.bibliographicCitationSemiconductor Science and Technology, v.27, no.10, pp.1 - 6-
dc.relation.isPartOfSemiconductor Science and Technology-
dc.citation.titleSemiconductor Science and Technology-
dc.citation.volume27-
dc.citation.number10-
dc.citation.startPage1-
dc.citation.endPage6-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusSTRUCTURE LASER-DIODES-
dc.subject.keywordPlusQUANTUM-WELLS-
dc.subject.keywordPlusEPITAXIAL-GROWTH-
dc.subject.keywordPlusDIFFUSION LENGTH-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusEMISSION-
dc.subject.keywordPlusGAAS(001)-
dc.subject.keywordPlusDYNAMICS-
dc.subject.keywordPlusEXCITONS-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1088/0268-1242/27/10/105027-
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