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Results 1-3 of 3 (Search time: 0.106 seconds).
Influence of Various Defects on 16nm Pattern in EUV Mask
오혜근
Conference
Issue Date
2010
Citation
International Conference on Electronic Materials and Nanotechnology for Green Environment
Publisher
대한 금속 재료 학회
Place
대한민국
Contact Hole Position Shift Behavior with Resist Reflow Process
오혜근
Conference
Issue Date
2010
Citation
International Conference on Electronic Materials and Nanotechnology for Green Environment
Publisher
대한 금속 재료 학회
Place
대한민국
Study of New Phase Shift Mask for the Reduction of Shadow Effect in 16nm Node
오혜근
Conference
Issue Date
2010
Citation
International Conference on Electronic Materials and Nanotechnology for Green Environment
Publisher
대한 금속 재료 학회
Place
대한민국
1
Discover
Author
OH, HYE KEUN
3
Date Issued
2010
3
Type
Conference
3
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