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Study of New Phase Shift Mask for the Reduction of Shadow Effect in 16nm Node
- Authors
- 오혜근
- Issue Date
- 21-Nov-2010
- Publisher
- 대한 금속 재료 학회
- Citation
- International Conference on Electronic Materials and Nanotechnology for Green Environment
- Conference Name
- International Conference on Electronic Materials and Nanotechnology for Green Environment
- Place
- 대한민국
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