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Results 1-4 of 4 (Search time: 0.001 seconds).
The extraction of development parameters by using cross-sectional critical shape error method
오혜근
Conference
Issue Date
2003
Citation
Microprocesses and Nanotechnology Conference 2003
Publisher
일본응용물리학회
Place
일본 도쿄
The prediction of aerial image and CD variation due to imperfect mask in Extreme Ultraviolet lithography
오혜근
Conference
Issue Date
2003
Citation
Microprocesses and Nanotechnology Conference 2003
Publisher
일본응용물리학회
Place
일본 도쿄
Effect of EUV light scattering from the rough absorber and buffer side wall
오혜근
Conference
Issue Date
2003
Citation
Microprocesses and Nanotechnology Conference 2003
Publisher
일본응용물리학회
Place
일본 도쿄
Prediction of High NA ArF lithography capabilities for 70nm technology node using simulation
오혜근
Conference
Issue Date
2003
Citation
Microprocesses and Nanotechnology Conference 2003
Publisher
일본응용물리학회
Place
일본 도쿄
1
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Author
OH, HYE KEUN
4
Date Issued
2003
4
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