Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Prediction of High NA ArF lithography capabilities for 70nm technology node using simulation
- Authors
- 오혜근
- Issue Date
- 29-Oct-2003
- Publisher
- 일본응용물리학회
- Citation
- Microprocesses and Nanotechnology Conference 2003
- Conference Name
- Microprocesses and Nanotechnology Conference 2003
- Place
- 일본 도쿄
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.