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Results 1-3 of 3 (Search time: 0.003 seconds).
Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation
오혜근
Conference
Issue Date
2017
Citation
SPIE ADVANCED LITHOGRAPHY
Publisher
SPIE
CD error caused by aberration and it's possible compensation by optical proximity correction in extreme ultraviolet lithography
오혜근
Conference
Issue Date
2017
Citation
SPIE ADVANCED LITHOGRAPHY
Publisher
SPIE
The impact of non-uniform wrinkle of multi-stack pellicle in EUV lithography
오혜근
Conference
Issue Date
2017
Citation
SPIE ADVANCED LITHOGRAPHY
Publisher
SPIE
1
Discover
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OH, HYE KEUN
3
Date Issued
2017
3
Type
Conference
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