Study of Sintering Behavior of Vapor Forms of 1-Octanethiol Coated Copper Nanoparticles for Application to Ink-Jet Printing Technology
- Authors
- Kwon, Jinhyeong; Park, Shinyoung; Haque, Md Mominul; Kim, Young-Seok; Lee, Caroline Sunyong
- Issue Date
- Apr-2012
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- Sintering; 1-Octanethiol; Cu; Nanoparticles
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.4, pp 3434 - 3437
- Pages
- 4
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- Volume
- 12
- Number
- 4
- Start Page
- 3434
- End Page
- 3437
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/33148
- DOI
- 10.1166/jnn.2012.5638
- ISSN
- 1533-4880
1533-4899
- Abstract
- Sub-50 nm copper nanoparticles coated with sub-5 nm 1-octanethiol layer for oxidation inhibition were examined to confirm the 1-octanethiol removal temperature as the sub-50 nm copper nanoparticles are sintered. As a result, 1-octanethiol Self-Assembled Multi-layers (SAMs) on sub-50 nm copper nanoparticles were successfully removed before sintering of copper nanoparticles so that a high density of copper line could be obtained. Finally, the line resistivity was measured and compared to verify the effect of sintering in different atmospheres. As a result, electrical resistivity of the copper pattern sintered in hydrogen atmosphere was measured at 6.96 x 10(-6) ohm-cm whereas that of the copper pattern sintered in mixed gas atmosphere was measured at 2.62 x 10(-5) ohm-cm. Thus, sintering of copper patterns was successfully done to show low electrical resistivity values. Moreover, removal of 1-octanethiol coating after sintering process was confirmed using X-ray photoelectron spectroscopy (XPS) analysis. By showing no sulfur content, XPS results indicate that 1-octanethiol is completely removed. Therefore, the vapor form of 1-octanethiol coating layers can be safely used as an oxidation inhibition layer for low temperature sintering processes and ink-jet applications.
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