Effect of numerical aperture and partialcoherence to the resist side wall angle

오혜근

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Effect of numerical aperture and partialcoherence to the resist side wall angle

Authors: 오혜근

Issue Date: 1-Mar-1996

Publisher: SPIE

Citation: SPIEOptical/Laser Microlithography

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/36805

Conference Name: SPIEOptical/Laser Microlithography

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Appears in Collections: COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 2. Conference Papers

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