Electron-emission properties of carbon nanotube micro-tips coated by amorphous carbon nitride films
DC Field | Value | Language |
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dc.contributor.author | Kim, Jong-Pil | - |
dc.contributor.author | Noh, Young-Rok | - |
dc.contributor.author | Kim, Jong-Uk | - |
dc.contributor.author | Park, Jin-Seok | - |
dc.date.accessioned | 2021-06-23T10:37:57Z | - |
dc.date.available | 2021-06-23T10:37:57Z | - |
dc.date.issued | 2011-09 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/37200 | - |
dc.description.abstract | An approach to the preparation of a tip-type of field emitter that is made up of carbon nanotubes (CNTs) coated with amorphous carbon nitride (a-CN(x)) films is presented for the purpose of enhancing its electron emission property. CNTs were directly grown on nano-sized conical-type tungsten tips via the inductively coupled plasma-chemical vapor deposition system, and a-CN(x) films were coated on the CNTs using an radio frequency magnetron sputtering system. The morphologies and microstructures of the a-CN(x)-coated CNTs were analyzed via field emission scanning electron microscopy, energy-dispersive x-ray spectroscopy, high-resolution transmission electron microscopy, and x-ray photoelectron spectroscopy. The electron emission properties of the a-CN(x)/CNT hetero-structures were measured using a high-vacuum field emission measurement system. The best field emission properties, such as a very low turn-on voltage of 500 V and a maximum emission current of 176 mu A were achieved for the CNT emitter coated with the 5 nm-thick a-CN(x) film. In addition, this emitter showed a highly stable behavior in long-term (up to 25 h) electron emission. (C) 2011 Elsevier B.V. All rights reserved. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.title | Electron-emission properties of carbon nanotube micro-tips coated by amorphous carbon nitride films | - |
dc.type | Article | - |
dc.publisher.location | 스위스 | - |
dc.identifier.doi | 10.1016/j.tsf.2011.05.046 | - |
dc.identifier.scopusid | 2-s2.0-80052129328 | - |
dc.identifier.wosid | 000295057000047 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.519, no.22, pp 7899 - 7903 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 519 | - |
dc.citation.number | 22 | - |
dc.citation.startPage | 7899 | - |
dc.citation.endPage | 7903 | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | sci | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | DIAMOND-LIKE CARBON | - |
dc.subject.keywordPlus | FIELD-EMISSION | - |
dc.subject.keywordAuthor | Carbon nanotubes | - |
dc.subject.keywordAuthor | Amorphous carbon nitrides | - |
dc.subject.keywordAuthor | Field emission property | - |
dc.subject.keywordAuthor | Stability | - |
dc.subject.keywordAuthor | Inductively coupled plasma chemical vapor deposition | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0040609011011916?via%3Dihub | - |
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