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Electron-emission properties of carbon nanotube micro-tips coated by amorphous carbon nitride films

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dc.contributor.authorKim, Jong-Pil-
dc.contributor.authorNoh, Young-Rok-
dc.contributor.authorKim, Jong-Uk-
dc.contributor.authorPark, Jin-Seok-
dc.date.accessioned2021-06-23T10:37:57Z-
dc.date.available2021-06-23T10:37:57Z-
dc.date.issued2011-09-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/37200-
dc.description.abstractAn approach to the preparation of a tip-type of field emitter that is made up of carbon nanotubes (CNTs) coated with amorphous carbon nitride (a-CN(x)) films is presented for the purpose of enhancing its electron emission property. CNTs were directly grown on nano-sized conical-type tungsten tips via the inductively coupled plasma-chemical vapor deposition system, and a-CN(x) films were coated on the CNTs using an radio frequency magnetron sputtering system. The morphologies and microstructures of the a-CN(x)-coated CNTs were analyzed via field emission scanning electron microscopy, energy-dispersive x-ray spectroscopy, high-resolution transmission electron microscopy, and x-ray photoelectron spectroscopy. The electron emission properties of the a-CN(x)/CNT hetero-structures were measured using a high-vacuum field emission measurement system. The best field emission properties, such as a very low turn-on voltage of 500 V and a maximum emission current of 176 mu A were achieved for the CNT emitter coated with the 5 nm-thick a-CN(x) film. In addition, this emitter showed a highly stable behavior in long-term (up to 25 h) electron emission. (C) 2011 Elsevier B.V. All rights reserved.-
dc.format.extent5-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE SA-
dc.titleElectron-emission properties of carbon nanotube micro-tips coated by amorphous carbon nitride films-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.1016/j.tsf.2011.05.046-
dc.identifier.scopusid2-s2.0-80052129328-
dc.identifier.wosid000295057000047-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.519, no.22, pp 7899 - 7903-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume519-
dc.citation.number22-
dc.citation.startPage7899-
dc.citation.endPage7903-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusDIAMOND-LIKE CARBON-
dc.subject.keywordPlusFIELD-EMISSION-
dc.subject.keywordAuthorCarbon nanotubes-
dc.subject.keywordAuthorAmorphous carbon nitrides-
dc.subject.keywordAuthorField emission property-
dc.subject.keywordAuthorStability-
dc.subject.keywordAuthorInductively coupled plasma chemical vapor deposition-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0040609011011916?via%3Dihub-
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ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)
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