Remote plasma MOCVD 법을 사용하여 형성된titanium nitride 박막의 step coverage변환에 관한 연구

오재응

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Remote plasma MOCVD 법을 사용하여 형성된titanium nitride 박막의 step coverage변환에 관한 연구

Authors: 오재응

Issue Date: 1-Feb-1995

Publisher: 한국과학 기술원

Citation: 제 2회 반도체 학술대회 노문집

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/37593

Conference Name: 제 2회 반도체 학술대회 노문집

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Appears in Collections: COLLEGE OF ENGINEERING SCIENCES > SCHOOL OF ELECTRICAL ENGINEERING > 2. Conference Papers

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