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반도체 공정중 연속적인 SC1-산화-HF에칭과정이 실리콘 표면에 미치는 영향
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박진구 | - |
| dc.date.accessioned | 2021-06-23T10:45:50Z | - |
| dc.date.available | 2021-06-23T10:45:50Z | - |
| dc.date.issued | 1994-11-01 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/37600 | - |
| dc.title | 반도체 공정중 연속적인 SC1-산화-HF에칭과정이 실리콘 표면에 미치는 영향 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국재료학회지 | - |
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)