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Measurement of nonuniform bowing in GaN/sapphire epi-wafers and subsequent stress analysis by using a theoretical model

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dc.contributor.authorJang, Yuseong-
dc.contributor.authorJang, Dong-Hyun-
dc.contributor.authorShim, Jong-In-
dc.contributor.authorShin, Dong Soo-
dc.date.accessioned2021-06-23T12:04:28Z-
dc.date.available2021-06-23T12:04:28Z-
dc.date.issued2011-03-
dc.identifier.issn0277-786X-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39123-
dc.description.abstractWe present our approach to measure the profile of nonuniformly bent GaN epi-wafers grown on sapphire substrates. By using a laser displacement sensor, the position of the epi-wafer is accurately measured and mapped. From the measured profile data, analysis of stress distributions over the nonuniformly bent wafer is performed by using a theoretical model. We show the result of theoretical analysis of how the stress tensors distribute over a wafer. The estimated stress tensors are related with optical properties such as photoluminescence of the wafer. © 2011 SPIE.-
dc.format.extent9-
dc.language영어-
dc.language.isoENG-
dc.publisherSPIE-
dc.titleMeasurement of nonuniform bowing in GaN/sapphire epi-wafers and subsequent stress analysis by using a theoretical model-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1117/12.874127-
dc.identifier.scopusid2-s2.0-79955766420-
dc.identifier.wosid000298084200043-
dc.identifier.bibliographicCitationProceedings of SPIE - The International Society for Optical Engineering, v.7939, pp 1 - 9-
dc.citation.titleProceedings of SPIE - The International Society for Optical Engineering-
dc.citation.volume7939-
dc.citation.startPage1-
dc.citation.endPage9-
dc.type.docTypeConference Paper-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaOptics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryOptics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusGaN-
dc.subject.keywordPlusGaN/sapphire-
dc.subject.keywordPlusLaser displacement sensors-
dc.subject.keywordPlusnonuniform bow-
dc.subject.keywordPlusProfile data-
dc.subject.keywordPlusSapphire substrates-
dc.subject.keywordPlusStress distribution-
dc.subject.keywordPlusStress tensors-
dc.subject.keywordPlusTheoretical models-
dc.subject.keywordPlusTime-resolved photoluminescence-
dc.subject.keywordPluswafer stress-
dc.subject.keywordPlusGallium alloys-
dc.subject.keywordPlusOptical properties-
dc.subject.keywordPlusPhotoluminescence-
dc.subject.keywordPlusStress analysis-
dc.subject.keywordPlusStress concentration-
dc.subject.keywordPlusTensors-
dc.subject.keywordPlusGallium nitride-
dc.subject.keywordAuthorGaN-
dc.subject.keywordAuthornonuniform bow-
dc.subject.keywordAuthortime-resolved photoluminescence-
dc.subject.keywordAuthorwafer stress-
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/7939/1/Measurement-of-nonuniform-bowing-in-GaN-sapphire-epi-wafers-and/10.1117/12.874127.short-
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