Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Nano gas cluster dry cleaning for damage free particle removal

Full metadata record
DC Field Value Language
dc.contributor.authorKim, Min su-
dc.contributor.authorKang, Bong Kyun-
dc.contributor.authorLee, Seung Ho-
dc.contributor.authorYoon, Deok joo-
dc.contributor.authorChoi, Hoomi-
dc.contributor.authorKim, Ho joong-
dc.contributor.authorKim, Tae sung-
dc.contributor.authorPark, Jin-Goo-
dc.date.accessioned2021-06-23T12:05:13Z-
dc.date.available2021-06-23T12:05:13Z-
dc.date.issued2011-00-
dc.identifier.issn1938-5862-
dc.identifier.issn1938-6737-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39151-
dc.description.abstractCO 2 gas cluster cleaning process for nano particles removal without pattern damage was investigated. Gas cluster cleaning process was performed for generating the nano-sized gas cluster in the vacuum chamber. When pressurized CO 2 gas was passed through the convergence-divergence (C-D) nozzle, the high speed and high energy gas clusters were generated. The cleaning force of CO 2 gas cluster is related to flow rate of the gas and gap distance between the nozzle and substrate. In our studies, the optimum gas flow rate and gap distance for nano-sized particles removal was found, respectively. Pattern damage tests of the poly-Si and a-Si pattern were also evaluated by SEM images. No pattern damages were observed at these optimum conditions. ©The Electrochemical Society.-
dc.format.extent8-
dc.language영어-
dc.language.isoENG-
dc.publisherThe Electrochemical Society-
dc.titleNano gas cluster dry cleaning for damage free particle removal-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1149/1.3630848-
dc.identifier.scopusid2-s2.0-84863153068-
dc.identifier.wosid000309535600029-
dc.identifier.bibliographicCitationECS Transactions, v.41, no.5, pp 229 - 236-
dc.citation.titleECS Transactions-
dc.citation.volume41-
dc.citation.number5-
dc.citation.startPage229-
dc.citation.endPage236-
dc.type.docTypeConference Paper-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.subject.keywordPlusCleaning process-
dc.subject.keywordPlusDamage-free-
dc.subject.keywordPlusGap distances-
dc.subject.keywordPlusGas clusters-
dc.subject.keywordPlusHigh energy-
dc.subject.keywordPlusNano-sized-
dc.subject.keywordPlusNano-sized particles-
dc.subject.keywordPlusOptimum conditions-
dc.subject.keywordPlusPattern damages-
dc.subject.keywordPlusSEM image-
dc.subject.keywordPlusVacuum chambers-
dc.subject.keywordPlusCarbon dioxide-
dc.subject.keywordPlusDry cleaning-
dc.subject.keywordPlusFlow rate-
dc.subject.keywordPlusNozzles-
dc.subject.keywordPlusSilicon-
dc.subject.keywordPlusTechnology-
dc.subject.keywordPlusGases-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/1.3630848-
Files in This Item
Go to Link
Appears in
Collections
COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Park, Jin Goo photo

Park, Jin Goo
ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
Read more

Altmetrics

Total Views & Downloads

BROWSE