Optical Investigation of Deep Ultraviolet Degradation of Pellicles
- Authors
- Cheon, Hyuknyeong; Choi, Hyungseok; Oh, Hye-Keun; An, Ilsin
- Issue Date
- May-2010
- Publisher
- IOP Publishing Ltd
- Citation
- Japanese Journal of Applied Physics, v.49, no.5, pp 1 - 5
- Pages
- 5
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- Japanese Journal of Applied Physics
- Volume
- 49
- Number
- 5
- Start Page
- 1
- End Page
- 5
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39859
- DOI
- 10.1143/JJAP.49.056701
- ISSN
- 0021-4922
1347-4065
- Abstract
- As optical lithography goes deep into the ultraviolet (UV) range for higher resolution, high-energy photons cause many problems that are associated with the photomask (PM). Upon repeated deep-UV exposure, unwanted crystals or layers can form on the PM surface following the photoreaction of surrounding contaminants. Moreover, the pellicle that is a part of the PM can react with deep UV, although it is designed to show high transparency and radiation durability. Our pellicle showed an initial reduction in thickness and then an increase in absorption after extended exposure to the 193 nm line of an ArF excimer laser. Both phenomena were responsible for the transmission loss of a pellicle. Particularly, the transmission loss caused by the thickness reduction was related to the interference effect. Lithography simulation showed that the reduced transmission by the pellicle led to the critical dimension variation. Moreover, a non-uniform reduction of thickness near the edge of the exposed area suggested that the apodization effect might occur near the edge of patterns. (c) 2010 The Japan Society of Applied Physics
- Files in This Item
-
Go to Link
- Appears in
Collections - COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF PHOTONICS AND NANOELECTRONICS > 1. Journal Articles
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39859)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.