Collapse behavior and forces of multistack nanolines
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Tae-Gon | - |
dc.contributor.author | Wostyn, Kurt | - |
dc.contributor.author | Mertens, Paul W. | - |
dc.contributor.author | Busnaina, Ahmed A. | - |
dc.contributor.author | Park, Jin-Goo | - |
dc.date.accessioned | 2021-06-23T13:39:53Z | - |
dc.date.available | 2021-06-23T13:39:53Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2010-01 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40031 | - |
dc.description.abstract | Two types of multistack nanolines (MNLs), Si-substrate (Si)/siliconoxynitride (SiON)/amorphous Si (a-Si)/SiO2 and Si/SiO2/polycrystalline Si (poly-Si)/SiO2 were used to measure the collapse force and to investigate their collapse behavior by an atomic force microscope (AFM). The Si/SiON/a-Si/SiO2 MNL showed a larger length of fragment in the collapse patterns at a smaller collapse force. The Si/SiO2/poly-Si/SiO2 MNL, however, demonstrated a smaller length of fragment at a higher applied collapse force. The collapse forces increased by the square of the linewidth in both Si/SiON/a-Si/SiO2 and Si/SiO2/poly-Si/SiO2 MNLs. Once an AFM tip touches an Si/SiON/a-Si/SiO2 line, which is a softer MNL, it was delaminated first at the Si/SiON interface. One end of the delaminated line was first broken and then the other end was bent until it was broken. A harder MNL, Si/SiO2/poly-Si/SiO2, however, was broken at two ends simultaneously after the delamination occurred at the Si/SiO2/poly-Si interface. The different collapse behaviors were attributed to the magnitude of adhesion forces at the stack material interfaces and the mechanical strength of MNLs. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Institute of Physics Publishing | - |
dc.title | Collapse behavior and forces of multistack nanolines | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jin-Goo | - |
dc.identifier.doi | 10.1088/0957-4484/21/1/015708 | - |
dc.identifier.wosid | 000272166500026 | - |
dc.identifier.bibliographicCitation | Nanotechnology, v.21, no.1, pp.1 - 7 | - |
dc.relation.isPartOf | Nanotechnology | - |
dc.citation.title | Nanotechnology | - |
dc.citation.volume | 21 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 7 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | HF/NITROGEN JET SPRAY | - |
dc.subject.keywordPlus | STRUCTURAL RELAXATION | - |
dc.subject.keywordPlus | CARBON NANOTUBES | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | REMOVAL | - |
dc.subject.keywordPlus | CALIBRATION | - |
dc.subject.keywordPlus | STRENGTH | - |
dc.subject.keywordPlus | PLASMA | - |
dc.subject.keywordPlus | SYSTEM | - |
dc.subject.keywordPlus | DAMAGE | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1088/0957-4484/21/1/015708 | - |
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