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Pattern deformation caused by deformed pellicle with ArF exposure
- Authors
- You, Jee-Hye; An, Ilsin; Oh, Hye-Keun
- Issue Date
- Mar-2010
- Publisher
- SPIE
- Citation
- Proceedings of SPIE - The International Society for Optical Engineering, v.7640, pp 1 - 7
- Pages
- 7
- Indexed
- SCIE
SCOPUS
- Journal Title
- Proceedings of SPIE - The International Society for Optical Engineering
- Volume
- 7640
- Start Page
- 1
- End Page
- 7
- ISSN
- 0277-786X
- Abstract
- It will directly affects pellicle degradation, at the irradiated part of the pellicle, and make a sloped pellicle surface and will act like a prism before change of phase or transmittance occurs, because the energies of C, F and O single bondings composing the ArF pellicle film is quite smaller than the energy of 193 nm ArF. Thus, outgoing light has information of smaller space than mask size. In order to offer some tip to find the appearance of pellicle thinning caused defect, several types of pattern deformation caused by pellicle degradation is studied. © 2010 SPIE.
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