Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods
- Authors
- Kong, Bo Hyun; Choi, Mi Kyung; Cho, Hyung Koun; Kim, Jae Hyun; Baek, Sungho; Lee, Jung-Ho
- Issue Date
- 2010
- Publisher
- Electrochemical Society, Inc.
- Keywords
- THIN-FILMS; SOLAR-CELLS; OXIDE; SILICON NANOWIRES; LIGHT-EMITTING DEVICES; ABSORPTION; ATOMIC LAYER DEPOSITION; SCATTERING
- Citation
- Electrochemical and Solid-State Letters, v.13, no.2, pp.K12 - K14
- Indexed
- SCIE
SCOPUS
- Journal Title
- Electrochemical and Solid-State Letters
- Volume
- 13
- Number
- 2
- Start Page
- K12
- End Page
- K14
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40569
- DOI
- 10.1149/1.3267051
- ISSN
- 1099-0062
- Abstract
- Al-doped ZnO (AZO) thin films were grown by atomic layer deposition (ALD) for use as transparent conductive oxides on high aspect ratio Si microrod arrays. The ALD-deposited AZO films showed high optical transmittance and electrical conductivity despite their polycrystalline structures and resulted in a superior conformal coating on the surface and side regions of the Si microrods. The films also exhibited an electrical performance identical to that of the AZO film on a flat Si substrate. These results revealed that ALD-deposited AZO films are promising candidates for electrodes in the next-generation optoelectronic devices based on low dimensional structures, which require conformal coating. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3267051] All rights reserved.
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