An extensive study on scratch generation during oxide CMP
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진구 | - |
dc.date.accessioned | 2021-06-23T14:40:38Z | - |
dc.date.available | 2021-06-23T14:40:38Z | - |
dc.date.created | 2021-02-18 | - |
dc.date.issued | 2009-11-19 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40652 | - |
dc.publisher | Japan planarization and CMP technical committee | - |
dc.title | An extensive study on scratch generation during oxide CMP | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | 박진구 | - |
dc.identifier.bibliographicCitation | 2009 ICPT | - |
dc.relation.isPartOf | 2009 ICPT | - |
dc.citation.title | 2009 ICPT | - |
dc.type.rims | ART | - |
dc.description.journalClass | 3 | - |
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