Effects of carbon on improved resistivity of low temperature chemical vapor deposited HfCN films
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jang,Jae Hyuck | - |
dc.contributor.author | Park,Tae Joo | - |
dc.contributor.author | Kim,Jeong Hwan | - |
dc.contributor.author | Na,Duk L | - |
dc.contributor.author | Park,Woo Young | - |
dc.contributor.author | Kim,Miyoung | - |
dc.contributor.author | Hwang,Cheol Seong | - |
dc.date.accessioned | 2021-06-23T14:41:01Z | - |
dc.date.available | 2021-06-23T14:41:01Z | - |
dc.date.issued | 2009-01 | - |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.issn | 1945-7111 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40679 | - |
dc.format.extent | 1 | - |
dc.publisher | Electrochemical Society, Inc. | - |
dc.title | Effects of carbon on improved resistivity of low temperature chemical vapor deposited HfCN films | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.bibliographicCitation | Journal of the Electrochemical Society, v.156, pp 0 - 0 | - |
dc.citation.title | Journal of the Electrochemical Society | - |
dc.citation.volume | 156 | - |
dc.citation.startPage | 0 | - |
dc.citation.endPage | 0 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
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