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Multilevel Programmable Oxide Diode for Cross-Point Memory by Electrical-Pulse-Induced Resistance Change

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dc.contributor.authorKim, Ki Hwan-
dc.contributor.authorKang, Bo Soo-
dc.contributor.authorLee, Myoung-Jae-
dc.contributor.authorAhn, Seung-Eon-
dc.contributor.authorLee, Chang Bum-
dc.contributor.authorStefanovich, Genrikh-
dc.contributor.authorXianyu, Wen Xu-
dc.contributor.authorKim, Chang Jung-
dc.contributor.authorPark, Youngsoo-
dc.date.accessioned2021-06-23T15:02:58Z-
dc.date.available2021-06-23T15:02:58Z-
dc.date.created2021-01-21-
dc.date.issued2009-10-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40857-
dc.description.abstractA multilevel one-time programmable (OTP) oxide diode for cross-point memory is introduced. The oxide diode is composed of a thin-film p-CuO/n-InZnOx (IZO). By applying negative electrical pulses, the p-CuO/n-IZO diode exhibited multilevel resistance states, and such characteristics of the p-CuO/n-IZO diode could be utilized as the cell of OTP cross-point memory. The resistance-change properties of the p-CuO/n-IZO diode originated possibly from a back-to-back diode phenomenon by oxygen ion migration in the IZO thin film.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleMultilevel Programmable Oxide Diode for Cross-Point Memory by Electrical-Pulse-Induced Resistance Change-
dc.typeArticle-
dc.contributor.affiliatedAuthorKang, Bo Soo-
dc.identifier.doi10.1109/LED.2009.2029247-
dc.identifier.scopusid2-s2.0-72049118178-
dc.identifier.wosid000270227600008-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.30, no.10, pp.1036 - 1038-
dc.relation.isPartOfIEEE ELECTRON DEVICE LETTERS-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume30-
dc.citation.number10-
dc.citation.startPage1036-
dc.citation.endPage1038-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPluslectric resistance-
dc.subject.keywordPlusOxygen-
dc.subject.keywordPlusThin film devices-
dc.subject.keywordPlusCross-point-
dc.subject.keywordPlusElectrical pulse-
dc.subject.keywordPlusInduced resistance-
dc.subject.keywordPlusIon migration-
dc.subject.keywordPlusOne-time programmables-
dc.subject.keywordPlusResistance state-
dc.subject.keywordAuthorCross-point-
dc.subject.keywordAuthordiode-
dc.subject.keywordAuthormemory-
dc.subject.keywordAuthoroxide-
dc.identifier.urlhttps://ieeexplore.ieee.org/document/5233829-
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