ScholarWorks@Hanyang University ERICA Campus

Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Reevaluation of hydrogen gas dissolved cleaning solutions in single wafer megasonic cleaning

Full metadata record
DC Field Value Language
dc.contributor.authorKang, Bong Kyun-
dc.contributor.authorLee, Seung Ho-
dc.contributor.authorKim, In Jung-
dc.contributor.authorChoi, Eun Suck-
dc.contributor.authorKim, Bong Woo-
dc.contributor.authorBusnaina, Ahmed.A.-
dc.contributor.authorHattori, Takeshi-
dc.contributor.authorPark, Jin-Goo-
dc.date.accessioned2021-06-23T16:39:35Z-
dc.date.available2021-06-23T16:39:35Z-
dc.date.issued2009-00-
dc.identifier.issn1938-5862-
dc.identifier.issn1938-6737-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/41803-
dc.description.abstractThe capability of hydrogenated DI water was reevaluated to apply to wafer cleaning instead of conventional cleaning chemicals. Its characteristics such as half life time, oxidation reduction potential (ORP), dissolved oxygen (DO) concentration, pH, and surface tension were measured as a function of hydrogen gas concentration. Also, hydrogenated DI water cleaning efficiency with addition of a very small amount of NH4OH by combining with megasonic (MS) was compared with cleaning efficiency of SC-1 and NH4OH spiked DI water. It was found that H2-DIW would be a valuable cleaning solution to avoid higher chemical consumption with better particle removal efficiency (PRE) than conventional cleaning solutions.-
dc.format.extent7-
dc.language영어-
dc.language.isoENG-
dc.publisherElectrochemical Society, Inc.-
dc.titleReevaluation of hydrogen gas dissolved cleaning solutions in single wafer megasonic cleaning-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1149/1.3202663-
dc.identifier.scopusid2-s2.0-74949103059-
dc.identifier.wosid000337745400034-
dc.identifier.bibliographicCitationECS Transactions, v.25, no.5, pp 273 - 279-
dc.citation.titleECS Transactions-
dc.citation.volume25-
dc.citation.number5-
dc.citation.startPage273-
dc.citation.endPage279-
dc.type.docTypeConference Paper-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusChemical consumption-
dc.subject.keywordPlusCleaning chemicals-
dc.subject.keywordPlusCleaning efficiency-
dc.subject.keywordPlusCleaning solution-
dc.subject.keywordPlusDissolved oxygen concentrations-
dc.subject.keywordPlusHalf life time-
dc.subject.keywordPlusHydrogen gas-
dc.subject.keywordPlusHydrogen gas concentrations-
dc.subject.keywordPlusMegasonic cleaning-
dc.subject.keywordPlusMegasonics-
dc.subject.keywordPlusOxidation reduction potential-
dc.subject.keywordPlusParticle removal efficiency-
dc.subject.keywordPlusSingle wafer-
dc.subject.keywordPlusWafer cleaning-
dc.subject.keywordPlusWater cleaning-
dc.subject.keywordPlusAir cleaners-
dc.subject.keywordPlusBiochemical oxygen demand-
dc.subject.keywordPlusChemical cleaning-
dc.subject.keywordPlusDissolution-
dc.subject.keywordPlusDissolved oxygen-
dc.subject.keywordPlusDissolved oxygen sensors-
dc.subject.keywordPlusHydrogenation-
dc.subject.keywordPluspH effects-
dc.subject.keywordPlusRemoval-
dc.subject.keywordPlusSemiconductor device manufacture-
dc.subject.keywordPlusSemiconductor switches-
dc.subject.keywordPlusSilicon wafers-
dc.subject.keywordPlusSurface tension-
dc.subject.keywordPlusSurface cleaning-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/1.3202663-
Files in This Item
Go to Link
Appears in
Collections
COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 1. Journal Articles
Show simple item record

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Park, Jin Goo photo

Park, Jin Goo
ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)
Read more

Altmetrics

Total Views & Downloads

CONTACT US

RSS_1.0 RSS_2.0 ATOM_1.0

55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr

COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

BROWSE

한국어