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development of attenuated PSM mask for extreme ultra violet lithography with minimized shadowing effect
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T18:02:57Z | - |
| dc.date.available | 2021-06-23T18:02:57Z | - |
| dc.date.created | 2021-02-18 | - |
| dc.date.issued | 2008-02-21 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/42636 | - |
| dc.publisher | 반도체산업협회 | - |
| dc.title | development of attenuated PSM mask for extreme ultra violet lithography with minimized shadowing effect | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | 15회 한국반도체학술대회 | - |
| dc.relation.isPartOf | 15회 한국반도체학술대회 | - |
| dc.citation.title | 15회 한국반도체학술대회 | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 3 | - |
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