development of attenuated PSM mask for extreme ultra violet lithography with minimized shadowing effect

오혜근

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development of attenuated PSM mask for extreme ultra violet lithography with minimized shadowing effect

Authors: 오혜근

Issue Date: 21-Feb-2008

Publisher: 반도체산업협회

Citation: 15회 한국반도체학술대회

Journal Title: 15회 한국반도체학술대회

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/42636

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Appears in Collections: COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 1. Journal Articles

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