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Comparative structural and electrical analysis of NiO and Ti doped NiO as materials for resistance random access memory

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dc.contributor.authorLee, M. J.-
dc.contributor.authorPark, Y.-
dc.contributor.authorAhn, S. E.-
dc.contributor.authorKang, B. S.-
dc.contributor.authorLee, C. B.-
dc.contributor.authorKim, K. H.-
dc.contributor.authorXianyu, W. X.-
dc.contributor.authorYoo, I. K.-
dc.contributor.authorLee, J. H.-
dc.contributor.authorChung, S. J.-
dc.contributor.authorKim, Y. H.-
dc.contributor.authorLee, C. S.-
dc.contributor.authorChoi, K. N.-
dc.contributor.authorChung, K. S.-
dc.date.accessioned2021-06-23T18:04:05Z-
dc.date.available2021-06-23T18:04:05Z-
dc.date.created2021-01-21-
dc.date.issued2008-01-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/42702-
dc.description.abstractIn order to investigate the mechanism behind bistable resistance switching in NiO thin films, we have done detailed x-ray photon spectroscopy (XPS) and x-ray diffraction Analysis (XRD) on NiO and Ti doped NiO samples fabricated under various conditions. We discovered that a high initial resistivity was required for samples to undergo bistable resistance switching, and the presence of metallic Ni content in these samples was determined by XPS. XRD data also showed that NiO grown with a relative (200) orientation was preferred over those grown with relative (111) orientation. (c) 2008 American Institute of Physics.-
dc.language영어-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.titleComparative structural and electrical analysis of NiO and Ti doped NiO as materials for resistance random access memory-
dc.typeArticle-
dc.contributor.affiliatedAuthorKang, B. S.-
dc.identifier.doi10.1063/1.2829814-
dc.identifier.scopusid2-s2.0-38149100067-
dc.identifier.wosid000252890700050-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.103, no.1, pp.1 - 5-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume103-
dc.citation.number1-
dc.citation.startPage1-
dc.citation.endPage5-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusPERMITTIVITY-
dc.subject.keywordPlusPOLARIZATION-
dc.subject.keywordAuthorFILMS-
dc.subject.keywordAuthorPERMITTIVITY-
dc.subject.keywordAuthorPOLARIZATION-
dc.identifier.urlhttps://aip.scitation.org/doi/10.1063/1.2829814-
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