반도체 공정용 차압식 질량 유량 제어 장치의 개발 및 성능 평가Development and Evaluation of Differential Pressure Type Mass Flow Controller for Semiconductor Fabrication Processing
- Other Titles
- Development and Evaluation of Differential Pressure Type Mass Flow Controller for Semiconductor Fabrication Processing
- Authors
- 안진홍; 강기태; 안강호
- Issue Date
- Sep-2008
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- Accuracy; Differential Pressure; Linearity; MFC (mass flow controller); Response Time; Semiconductor; Sensor
- Citation
- 반도체디스플레이기술학회지, v.7, no.3, pp.29 - 34
- Indexed
- KCI
OTHER
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 7
- Number
- 3
- Start Page
- 29
- End Page
- 34
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/42833
- ISSN
- 1738-2270
- Abstract
- This paper describes the fabrication and characterization of a differential pressure type integrated mass-flow controller made of stainless steel for reactive and corrosive gases. The fabricated mass-flow controller is composed of a normally closed valve and differential pressure sensor. A stacked solenoid actuator mounted on a base-block is utilized for precise and rapid control of gas flow. The differential pressure flow sensor consisting of four diaphragms can detect a flow rate by deflection of diaphragm. By a feedback control from the flow sensor to the valve actuator, it is possible to keep the flow rate constant. This device shows a fast response less than 0.3 sec. Also, this device shows accuracy less than 0.1 % of full scale. It is confirmed that this device is not attacked by toxic gas, so the integrated mass-flow controller can be applied to advanced semiconductor processes which need fine mass-flow control corrosive gases with fast response.
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Collections - COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MECHANICAL ENGINEERING > 1. Journal Articles
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